Magnetron sputtering

It is applicable to almost all metal, alloy and ceramic materials to make films.

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Magnetron sputtering coating equipment

Description

Advantages of magnetron sputtering:

1. It is applicable to almost all metal, alloy and ceramic materials to make films.

2. Easy control of coating rate, high deposition rate and high power efficiency.

3. It belongs to low-energy sputtering with low substrate temperature rise.

Application scope:

● electronic industry (IC semiconductor components, display components, magnetic recording, optoelectronics, piezoelectric films)

● solar energy utilization (solar cell, absorption film, reflection film)

● optical applications (gratings)

● mechanochemical applications (lubrication, wear resistance, corrosion resistance)

● plastics industry (decoration, hardening)

Magnetron sputtering (PVD) split type

● limit vacuum degree: ≤ 5.0x10-5pa.

● restore vacuum: the system is pumped from the atmosphere to 6.0x10-4pa ≤ 40min.

● non uniformity of film thickness ≤± 5%; Inter slice nonuniformity ≤± 5%; Non uniformity between batches ≤± 5%.

● layout of substrate on and sputtering target on.

● rotate the substrate table, and the speed is continuously adjustable; The substrate height can be adjusted online.

● sample heating temperature is 0-250 ℃, continuously adjustable, substrate temperature uniformity: ≤± 5 ℃; Temperature control accuracy ± 1 ℃.

● air extraction system: mechanical pump and molecular pump unit.

● control system: the system controls the whole system by touch screen and imported PLC.

● reserved expansion cavity interface.

The specific configuration and structure can be customized