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Multi-functional Magnetron Sputtering Coating Equipment

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Magnetron Sputtering Coating Equipment


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Product Description

  This system is a single-chamber, ultra-high-vacuum, multi-functional magnetron sputtering coating system, suitable for the development of nanoscale single-layer, multilayer functional films, and composite films—ranging from various hard coatings to metallic films, alloy films, and dielectric films.
  The magnetron sputtering chamber measures approximately Φ400 × 400 mm and features a cylindrical, vertical, all-stainless-steel construction. It can accommodate three standard magnetron targets, with the exterior surface subjected to shot-peening for a matte finish. The chamber is equipped with a front-opening sample-loading door and employs a centripetal sputtering configuration. The magnetron targets are 60 mm in diameter and include both ferromagnetic and non-ferromagnetic, imported-standard replicas, each fitted with an independent shutter. The sample stage is both heated and rotatable.
 
 

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