Multi function magnetron sputtering coating equipment

The system is an ultra-high vacuum multifunctional magnetron sputtering coating system with single chamber structure, which can be used to develop nano single-layer, multi-layer functional films and composite films - various hard films, metal films, alloy films, dielectric films, etc. Magnetron sputtering chamber approx Φ four hundred × 400mm, cylindrical vertical all stainless steel structure, three standard magnetic control targets can be installed, and the outer surface is shot peened and Matt treated. The front door loading adopts centripetal sputtering. The magnetron target is 60mm, and the magnetic conductive and non-magnetic imitation imported standard targets. Each target has an independent baffle. The sample table can be heated and rotated.

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Magnetron sputtering coating equipment

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Description

Magnetron sputtering chamber approx Φ four hundred × 400mm, cylindrical vertical all stainless steel structure, three standard magnetic control targets can be installed, and the outer surface is shot peened and Matt treated. The front door loading adopts centripetal sputtering. The magnetron target is 60mm, and the magnetic conductive and non-magnetic imitation imported standard targets. Each target has an independent baffle. The sample table can be heated and rotated.

Magnetron sputtering

Vertical rectangular target magnetron sputtering equipment (four target)

Magnetron sputtering

Vertical rectangular target magnetron sputtering equipment (four target)