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ADD：No. four, U Valley, Shenyang, Shenyang, Liaoning
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Vertical rectangular target magnetron sputtering equipment (four target)
The equipment is a vertical four target rectangular target magnetron sputtering equipment, which can be used for plating single-layer film
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Magnetron sputtering coating equipment
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Description
The equipment is a vertical four target rectangular target magnetron sputtering equipment, which can be used for plating single-layer film, multi-layer film, alloy film, etc.
Number of rectangular magnetron targets: 4
Target size: 240 × eighty-five
Opening mode: upper cover opening
The substrate can be selected and the speed can be adjusted
The substrate can be heated up to 750 ℃
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No. four, U Valley, Shenyang, Shenyang, Liaoning
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