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Vertical Rectangular Target Magnetron Sputtering System (Four Target Stations)

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Magnetron Sputtering Coating Equipment

Product Description

This equipment is a vertical, four-target rectangular-target magnetron sputtering system, suitable for depositing single-layer films, multilayer films, alloy films, and other coatings.

Number of rectangular magnetron sputtering targets: 4

Target size: 240×85

Opening method: top-opening lid

Substrate options available; rotation speed adjustable.

The substrate can be heated, with a maximum heating temperature of 750°C.

Multi-functional Magnetron Sputtering Coating Equipment

Four-target magnetron sputtering coating equipment 1

Multi-functional Magnetron Sputtering Coating Equipment

Four-target magnetron sputtering coating equipment 1

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