Four target magnetron sputtering coating equipment

The equipment is a single cavity high vacuum magnetic control equipment Φ four hundred and fifty × 420mm, the vacuum system consists of 600L / S molecular pump

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Magnetron sputtering coating equipment

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Description

The equipment is a single cavity high vacuum magnetic control equipment Φ four hundred and fifty × 420mm, the vacuum system consists of 600L / S molecular pump, 8L / s mechanical pump and relevant valves. Four sets of permanent magnet targets with a diameter of 60mm and a diameter of 80mm that can change the angle of the target head and a set of cf200 sample table with a diameter of 80mm, which can be heated at 800 ℃, which can adjust the speed of rotation and change the orbit revolution are configured. In addition, in order to meet the needs of users for on-line measurement of ion current density, a set of on-line measurement device which can be accurately adjusted up and down and can be rotated is configured. Four permanent magnet targets can move up and down, change the target base distance, and the adjustment range is 50mm-100mm from the sample.

Vertical rectangular target magnetron sputtering equipment (four target)