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Four-target magnetron sputtering coating equipment 1

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Magnetron Sputtering Coating Equipment


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Product Description

  This equipment is a single-chamber high-vacuum magnetron sputtering system with a chamber diameter of Φ450 × 420 mm. The vacuum system comprises a 600 L/s molecular pump, an 8 L/s mechanical pump, and associated valves. It is equipped with four sets of permanent-magnet targets, each with a 60-mm-diameter target holder featuring baffles and adjustable target-tilt angles, as well as one CF200 sample stage with an 80-mm-diameter platform that can be heated up to 800°C, driven by a variable-speed motor for controlled rotation and orbital motion with adjustable trajectory. In addition, to meet users’ requirements for on-line measurement of ion current density and other parameters, the system includes one set of an on-line measurement device that allows precise vertical adjustment and rotational positioning. The four permanent-magnet targets can be vertically translated to vary the target-to-substrate distance, with an adjustment range of 50–100 mm from the sample surface.
 
 
 

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