Array type plasma enhanced chemical vapor deposition system (PECVD)

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PECVD

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Description

The three vacuum chambers share two vacuum units. The sample table in the deposition chamber can be heated and lifted.

The three deposition chambers of this system are cylindrical（ φ 430 * 456) vertically installed fully enclosed structure, with observation window on the door; The main components used in the whole unit include five gate valves (two CF150 gate valves are connected to several sedimentation chambers, and the other three CF150 gate valves are connected to the molecular pump). Three molecular pumps (600L/S), three mechanical pumps (4L/S), three elevatable, heated sample tables, and one sample transfer mechanism. Two CF150 gate valves are used to transfer samples between three vacuum chambers.

The main electronic control devices are:; Two electric control cabinets, one PLC program control machine, three heating power supplies for the sample table, four vacuum meters, two flow indicators and other various electrical accessories.

The system consists of deposition room (P, N, I), air circuit control system, electric control system, safety protection alarm system, etc.

Vacuum pumping time: deposition chamber; 5x10-4 Pa in 40 minutes,

Overall leakage rate of equipment; ≤ 5Pa after shutdown for 12 hours.

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