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High-Vacuum Thermal Evaporation Equipment

Category:

Resistance Heating Evaporation Equipment


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Product Description

  This equipment is primarily designed for teaching and research applications in universities and research institutions; it features a split-design architecture, with the electrical control system incorporating a touch screen and a PLC.
Technical Specifications:
  1. The pumping system employs a mechanical pump and a molecular pump, ensuring a clean vacuum environment.
  2. Ultimate vacuum: ≤5.0×10 -5 Pa.
  3. Recovery time from vacuum ≤ 40 min (≤ 6.0 × 10 -4 Pa)
  4. Equipped with a metal evaporation source (tungsten filament), an organic beam source furnace, and other components; film thickness can be measured online.
  5. The sample can rotate, enabling gapless in-line mask alignment twice; it can also be raised and lowered in-line to meet the optimal coating process requirements.
  6. The steam power supply operates in a 1-into-2 mode, with electrically controlled switching.
 
 
 

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