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Double chamber magnetic control and thermal evaporation equipment

High vacuum double chamber coating equipment is equipped with magnetron sputtering chamber and resistance thermal evaporation chamber.

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Four target magnetron sputtering coating equipment

The equipment is a single cavity high vacuum magnetic control equipment Φ four hundred and fifty × 420mm, the vacuum system consists of 600L / S molecular pump

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Vertical rectangular target magnetron sputtering equipment (four target)

The equipment is a vertical four target rectangular target magnetron sputtering equipment, which can be used for plating single-layer film

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Multi function magnetron sputtering coating equipment

The system is an ultra-high vacuum multifunctional magnetron sputtering coating system with single chamber structure, which can be used to develop nano single-layer, multi-layer functional films and composite films - various hard films, metal films, alloy films, dielectric films, etc. Magnetron sputtering chamber approx Φ four hundred × 400mm, cylindrical vertical all stainless steel structure, three standard magnetic control targets can be installed, and the outer surface is shot peened and Matt treated. The front door loading adopts centripetal sputtering. The magnetron target is 60mm, and the magnetic conductive and non-magnetic imitation imported standard targets. Each target has an independent baffle. The sample table can be heated and rotated.

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Magnetron sputtering

It is applicable to almost all metal, alloy and ceramic materials to make films.

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Magnetron sputtering

It is applicable to almost all metal, alloy and ceramic materials to make films.

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Clusters High vacuum coating equipment multifunction

The glove box is used to meet the user's requirements that the water oxygen content is less than 1ppm

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Double chamber magnetic control and thermal evaporation equipment

High vacuum double chamber coating equipment is equipped with magnetron sputtering chamber and resistance thermal evaporation chamber. The specific specifications are non-standard customized and connected with the glove box.    

隐藏域元素占位

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