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Address: No. 6-5, Phase IV, Liandong U-Grove, Shenbei New District, Shenyang City, Liaoning Province
Mobile phone:13998121527(Manager Li)
Landline:024-86670968,024-86626713
Email:LiLu@kcvac.cn
Website:www.kcvac.cn
Product Center
Cluster-Type High-Vacuum Multifunctional Coating Equipment
Category:
Magnetron Sputtering Coating Equipment
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Product Description
Equipment features:
1. A glove box is used to meet the requirement that both water and oxygen levels in the chamber are less than 1 ppm.
2. The vacuum system supports multiple in-line masking operations and can meet customer requirements for zero gap between the substrate and the mask plate.
3. The evaporation electrode is fully sealed and features a high-temperature tungsten electrode; this evaporation source is an original innovation of our company.
4. The organic beam-source furnace is also a patent of our company, offering precise temperature control within 700°C and featuring a fully enclosed design that effectively prevents cross-contamination.
5. Both the evaporation chamber and the magnetron sputtering chamber are equipped with a high-vacuum sample holder that is heated, vertically adjustable, and rotatable, with a lifting stroke of 40–100 mm (user-definable). The heating temperature ranges from room temperature to 300°C, is continuously adjustable, and has an accuracy of ±1°C. All functions are electronically controlled and operated via a touch screen.
Main technical parameters:
1. The ultimate vacuum level of the two coating chambers can reach 3×10 -5 pa, transfer chamber and sample storage 5*10 -4 pa, system leak rate 1*10 -8 pa/s
2. The maximum size of platable samples is 100 mm × 100 mm, with a maximum sample heating temperature of 300°C. Film uniformity is ≤ ±5%.
3. The sample stage is rotatable, with a continuously adjustable rotation speed of 2 to 30 revolutions per minute.
4. The maximum temperature of the metal evaporation electrode is 2000°C, and the maximum temperature of the organic evaporation source is 700°C.
5. It can load four substrates in a single clamping operation, perform multiple mask alignments, and fabricate four devices in-situ under vacuum, thereby ensuring the optimal requirement of zero gap between the mask aligner and the substrate.
6. The magnetically controlled target has a maximum power of 500 W and a swing angle of 40°.
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