Clusters High vacuum coating equipment multifunction

Equipment features:

1. The glove box is used to meet the user's requirements that the water oxygen content is less than 1ppm

2. Vacuum online can mask multiple times, and can meet the user's requirements for no gap between substrate and mask plate

3. The evaporation electrode is a fully enclosed, high-temperature tungsten electrode, and the evaporation source is originally created by the company

4. The organic beam source furnace is also the patent of our company. It can accurately control the temperature within 700 ℃ and is a fully enclosed structure, which effectively avoids cross pollution

5. The evaporation chamber and magnetron sputtering chamber are equipped with a high vacuum sample placement table that can be heated, raised and lowered and rotated, with a lifting stroke of 40-100mm (which can be determined by the user), and the heating temperature is continuously adjustable from room temperature to 300 ℃, with an error of ± 1 ℃. All functions are realized by electric and operated by touch screen

Main technical parameters:

1. The limit vacuum degree of the two coating chambers can reach 3 * 10-5pa, the transfer chamber and sample library can reach 5 * 10-4Pa, and the system leakage rate is 1 * 10-8pa / s

2. The maximum size of the plated sample is 100mm * 100mm, and the maximum heating temperature of the sample is 300 ℃. Film forming uniformity ≤± 5%

3. The sample table can be rotated, and the rotating speed is 2-30 revolutions per minute, which can be continuously adjusted

4. The maximum temperature of metal evaporation electrode is 2000 ℃, and the maximum temperature of organic evaporation source is 700 ℃

5. Four substrates can be loaded at one time, multiple masks can be performed, and four devices can be fabricated online in vacuum. The best requirement to ensure that there is no gap between the mask and the substrate

6. The maximum power of magnetron target is 500W, and the swing angle is 40 °