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Address: No. 6-5, Phase IV, Liandong U-Grove, Shenbei New District, Shenyang City, Liaoning Province
Mobile phone:13998121527(Manager Li)
Landline:024-86670968,024-86626713
Email:LiLu@kcvac.cn
Website:www.kcvac.cn
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Multi-functional Vapor Deposition Equipment
Category:
Resistance Heating Evaporation Equipment
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Product Description
Technical Indicators:
1. The ultimate vacuum of the vacuum chamber reaches 5×10 -5 Pa, the leakage rate after 12 hours of shutdown ≤ 5 Pa.
2. The vacuum chamber is equipped with one set of compact sample holders, including a large baffle and 16 small baffles, all manually controlled for convenient and quick operation; each small baffle can hold two 30×30 mm samples.
3. There are a total of 14 evaporation sources, including 10 organic evaporation sources and 4 metal evaporation sources. The temperature control accuracy is ±1°C, and the system can achieve stable deposition rates through temperature or current compensation.
4. The metal evaporation source is equipped with four 1000 W silicon-controlled rectifier (SCR) voltage-regulating power supplies, each paired with one unit. It is connected via copper electrodes, and tungsten filaments or tantalum boats can be clamped at both ends. Tungsten filaments are suitable for evaporating filamentous or large-particle materials, while tantalum boats are ideal for evaporating powdered materials. The evaporation source features a fully sealed ceramic design to prevent cross-contamination.
5. The organic evaporation source is equipped with 10 single-channel, temperature-controlled power supplies; the organic source temperature can be adjusted from room temperature to 500°C, depending on the material and user requirements.
6. The sample stage features rotational and vertical adjustment capabilities, allowing for one in-line mask plate change and simultaneous loading of 16 samples measuring 30 mm × 30 mm. Each pair of samples is equipped with a small baffle, and a PLC-controlled stepper motor performs 16 positioning steps for each baffle, enabling the robotic arm to push and pull the baffles. The distance between the samples and the evaporation source is maintained at 200–300 mm.
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