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Ultra-High Vacuum Pulsed Laser Coating Equipment

Category:

Pulsed Laser Deposition Coating Equipment

Product Description

This equipment is an ultra-high-vacuum pulsed laser deposition system, primarily used for the preparation of superconducting thin films, semiconductor thin films, ferroelectric thin films, and ultrahard thin films, among others.

Ultimate vacuum: 2×10 ^-6 Pa

Laser target: one set with four target positions, capable of both orbital and rotational motion.

Substrate size: 60 mm

Substrate heating temperature: 0–700°C, controllable, with temperature control accuracy of ±1°C.

Inner diameter of the vacuum chamber sphere: Φ450 mm

Vacuum Pulsed Laser Coating Equipment

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