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Array-type Plasma-Enhanced Chemical Vapor Deposition (PECVD) System

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PECVD


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Product Description

  Three vacuum chambers share two sets of vacuum pumping units. The sample stage in the deposition chamber is both heaterable and vertically adjustable.
  The three deposition chambers in this system are vertically mounted cylindrical units (φ430 × 456) with a fully enclosed structure and equipped with observation windows on the doors. The main components of the entire system include five slide valves—two CF150 slide valves for interconnecting several deposition chambers, and three additional CF150 slide valves for connecting the molecular pumps. The system is also outfitted with three molecular pumps (600 L/s), three mechanical pumps (4 L/s), three height-adjustable, heated sample stages, and one sample transfer mechanism. Notably, two of the CF150 slide valves are dedicated to transferring samples among the three vacuum chambers.
  The main electrical control components include two electrical control cabinets, one PLC programmable controller, three sample-stage heating power supplies, four vacuum gauges, two flow display instruments, and various other electrical accessories.
  The system comprises a deposition chamber (P, N, and I chambers), an gas delivery control system, an electrical control system, and a safety protection and alarm system, among other components.
  Vacuum pumping time: deposition chamber; 40 minutes to reach 5×10 -4 Dad,
  Overall equipment leakage rate: ≤ 5 Pa after 12 hours of shutdown.
 
 
 

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